The main use of graphite in PECVD (Plasma Enhanced Chemical Vapor Deposition) carrier plates is to provide stable substrate support and thermal conductivity. The following are the main applications of graphite in PECVD carrier plates:
Substrate support: PECVD is a process technology for thin film deposition in which thin films are deposited on a substrate. As the supporting structure of the substrate, the graphite carrier plate can provide a stable platform to ensure the uniformity and consistency of the film during the process. Graphite’s high strength and durability make it an ideal carrier plate material, capable of withstanding high temperatures and mechanical stress.
Thermal conductivity: PECVD process usually needs to be carried out at high temperature to promote gas phase reaction and film growth. Graphite has excellent thermal conductivity, which can effectively conduct heat from the substrate to other parts of the carrier plate to ensure uniform temperature and stability of the entire substrate. This helps avoid hot spot formation and film non-uniformity, improving process accuracy and repeatability.
In summary, the main use of graphite in PECVD carrier plates is to provide stable substrate support and excellent thermal conductivity. As a substrate support, graphite can ensure the uniformity and consistency of the film in the process. As a thermally conductive material, graphite can effectively conduct heat away from the substrate, ensuring temperature uniformity and stability in the process. The application of graphite in the PECVD process helps to improve the quality of film deposition and the controllability of the process.